Product Overview

The AENI RF matcher automatically converts the impedance (capacitive or inductive) of the plasma cavity during operation into a state capable of maximum power output from the RF power source.

Product Features

• Fast and accurate matching algorithm
  Automatic adjustment matching, high reliability
  Advanced RF Power Measurement System
  Full digital control technology
  Support pulse mode
  Can be widely used with a variety of capacitive or inductive impedance

Field of Application

• ETCH Etching process
  IMP Ion Implantation
  CVD Chemical Facies Deposition
  ASHER Plasma Glue remover
  PVD Physical Vapor Deposition